dc.contributor.author | Simoen, Eddy | |
dc.contributor.author | Mitard, Jerome | |
dc.contributor.author | Hellings, Geert | |
dc.contributor.author | Eneman, Geert | |
dc.contributor.author | De Jaeger, Brice | |
dc.contributor.author | Witters, Liesbeth | |
dc.contributor.author | Vincent, Benjamin | |
dc.contributor.author | Loo, Roger | |
dc.contributor.author | Delabie, Annelies | |
dc.contributor.author | Sioncke, Sonja | |
dc.contributor.author | Caymax, Matty | |
dc.contributor.author | Claeys, Cor | |
dc.date.accessioned | 2021-10-20T16:10:43Z | |
dc.date.available | 2021-10-20T16:10:43Z | |
dc.date.issued | 2012 | |
dc.identifier.issn | 1369-8001 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21515 | |
dc.source | IIOimport | |
dc.title | Challenges and opportunities in advanced Ge pMOSFETs | |
dc.type | Journal article | |
dc.contributor.imecauthor | Simoen, Eddy | |
dc.contributor.imecauthor | Mitard, Jerome | |
dc.contributor.imecauthor | Hellings, Geert | |
dc.contributor.imecauthor | Eneman, Geert | |
dc.contributor.imecauthor | De Jaeger, Brice | |
dc.contributor.imecauthor | Witters, Liesbeth | |
dc.contributor.imecauthor | Vincent, Benjamin | |
dc.contributor.imecauthor | Loo, Roger | |
dc.contributor.imecauthor | Delabie, Annelies | |
dc.contributor.imecauthor | Caymax, Matty | |
dc.contributor.orcidimec | Simoen, Eddy::0000-0002-5218-4046 | |
dc.contributor.orcidimec | Mitard, Jerome::0000-0002-7422-079X | |
dc.contributor.orcidimec | Hellings, Geert::0000-0002-5376-2119 | |
dc.contributor.orcidimec | Eneman, Geert::0000-0002-5849-3384 | |
dc.contributor.orcidimec | De Jaeger, Brice::0000-0001-8804-7556 | |
dc.contributor.orcidimec | Loo, Roger::0000-0003-3513-6058 | |
dc.date.embargo | 9999-12-31 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 588 | |
dc.source.endpage | 600 | |
dc.source.journal | Materials Science in Semiconductor Processing | |
dc.source.issue | 6 | |
dc.source.volume | 15 | |
imec.availability | Published - open access | |