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Rapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation

dc.contributor.authorSivoththaman, Sivanarayanamoorthy
dc.contributor.authorLaureys, Wim
dc.contributor.authorNijs, Johan
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-09-30T09:34:08Z
dc.date.available2021-09-30T09:34:08Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2151
dc.sourceIIOimport
dc.titleRapid thermal annealing of spin-coated phosphoric acid films for shallow junction formation
dc.typeJournal article
dc.contributor.imecauthorMertens, Robert
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage392
dc.source.endpage394
dc.source.journalApplied Physics Letters
dc.source.issue3
dc.source.volume71
imec.availabilityPublished - open access


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