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Scalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications

dc.contributor.authorSwerts, Johan
dc.contributor.authorArmini, Silvia
dc.contributor.authorCarbonell, Laure
dc.contributor.authorDelabie, Annelies
dc.contributor.authorFranquet, Alexis
dc.contributor.authorMertens, Sofie
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorSchaekers, Marc
dc.contributor.authorWitters, Thomas
dc.contributor.authorTokei, Zsolt
dc.contributor.authorBeyer, Gerald
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorGravey, Virginie
dc.contributor.authorCockburn, Andrew
dc.contributor.authorShah, Kavita
dc.contributor.authorAubuchon, Joseph
dc.date.accessioned2021-10-20T16:38:37Z
dc.date.available2021-10-20T16:38:37Z
dc.date.issued2012
dc.identifier.issn0734-2101
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21574
dc.sourceIIOimport
dc.titleScalability of plasma enhanced atomic layer deposited ruthenium films for interconnect applications
dc.typeJournal article
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorMertens, Sofie
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorWitters, Thomas
dc.contributor.imecauthorTokei, Zsolt
dc.contributor.imecauthorBeyer, Gerald
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCockburn, Andrew
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.contributor.orcidimecMertens, Sofie::0000-0002-1482-6730
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage01A103
dc.source.journalJournal of Vacuum Science and Technology A
dc.source.issue1
dc.source.volume30
dc.identifier.urlhttp://avspublications.org/jvsta/resource/1/jvtad6/v30/i1/p01A103_s1
imec.availabilityPublished - open access


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