Show simple item record

Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition

dc.contributor.authorSwerts, Johan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSalimullah M. M., Salimullah
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKim, Min-Soo
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-20T16:39:07Z
dc.date.available2021-10-20T16:39:07Z
dc.date.issued2012
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21575
dc.sourceIIOimport
dc.titleImpact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition
dc.typeJournal article
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpageP19
dc.source.endpageP21
dc.source.journalECS Solid State Letters
dc.source.issue2
dc.source.volume1
imec.availabilityPublished - open access


Files in this item

No Thumbnail [100%x80]
Name:
24807.pdf
Size:
289.1Kb
Format:
PDF
View/open

This item appears in the following collection(s)

Show simple item record