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Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition
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Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Swerts, Johan
;
Delabie, Annelies
;
Salimullah M. M., Salimullah
;
Popovici, Mihaela Ioana
;
Kim, Min-Soo
;
Schaekers, Marc
;
Van Elshocht, Sven
Journal
ECS Solid State Letters
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1768
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Views
1768
since deposited on 2021-10-20
6
last month
Acq. date: 2025-12-16
Citations