Publication:

Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition

Date

2012
Journal article
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dc.contributor.authorSwerts, Johan
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSalimullah M. M., Salimullah
dc.contributor.authorPopovici, Mihaela Ioana
dc.contributor.authorKim, Min-Soo
dc.contributor.authorSchaekers, Marc
dc.contributor.authorVan Elshocht, Sven
dc.contributor.imecauthorSwerts, Johan
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorPopovici, Mihaela Ioana
dc.contributor.imecauthorKim, Min-Soo
dc.contributor.imecauthorSchaekers, Marc
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecKim, Min-Soo::0000-0003-0211-0847
dc.contributor.orcidimecSchaekers, Marc::0000-0002-1496-7816
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.accessioned2021-10-20T16:39:07Z
dc.date.available2021-10-20T16:39:07Z
dc.date.embargo9999-12-31
dc.date.issued2012
dc.identifier.issn2162-8726
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21575
dc.source.beginpageP19
dc.source.endpageP21
dc.source.issue2
dc.source.journalECS Solid State Letters
dc.source.volume1
dc.title

Impact of the plasma ambient and the ruthenium precursor on the growth of ruthenium films by plasma enhanced atomic layer deposition

dc.typeJournal article
dspace.entity.typePublication
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