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Interface chemistry of Al2O3/III-V upon atomic layer deposition

dc.contributor.authorTallarida, Massimo
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCuypers, Daniel
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorLin, Dennis
dc.contributor.authorMichling, Marcel
dc.contributor.authorFriedrich, Daniel
dc.contributor.authorDe Clercq, Astrid
dc.contributor.authorDelabie, Annelies
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorLocquet, Jean-Pierre
dc.contributor.authorCaymax, Matty
dc.contributor.authorSchmeisser, Dieter
dc.date.accessioned2021-10-20T16:42:39Z
dc.date.available2021-10-20T16:42:39Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21582
dc.sourceIIOimport
dc.titleInterface chemistry of Al2O3/III-V upon atomic layer deposition
dc.typeOral presentation
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorLin, Dennis
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewno
dc.source.conferenceE-MRS Spring Meeting Symposium M: More than Moore
dc.source.conferencedate14/05/2012
dc.source.conferencelocationStrasbourg France
dc.identifier.urlhttp://www.emrs-strasbourg.com/index.php?option=com_abstract&task=view&id=168&year=2012&Itemid=&id_season=6&PHPSESSID=4a1e1f1d31
imec.availabilityPublished - imec


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