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Evaluation of roughness transfer from Litho to Etch using CD-SEM

dc.contributor.authorTanaka, Motohiro
dc.contributor.authorIshimoto, Toru
dc.contributor.authorKazumi, H.
dc.contributor.authorCheng, Shaunee
dc.date.accessioned2021-10-20T16:45:39Z
dc.date.available2021-10-20T16:45:39Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21588
dc.sourceIIOimport
dc.titleEvaluation of roughness transfer from Litho to Etch using CD-SEM
dc.typeProceedings paper
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage83242R
dc.source.conferenceMetrology, Inspection, and Process Control for Microlithography XXVI
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 8324


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