dc.contributor.author | Teugels, Lieve | |
dc.contributor.author | Van den Eynde, Matthias | |
dc.contributor.author | Delande, Tinne | |
dc.contributor.author | Leunissen, Peter | |
dc.date.accessioned | 2021-10-20T16:53:47Z | |
dc.date.available | 2021-10-20T16:53:47Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21605 | |
dc.source | IIOimport | |
dc.title | Chemical mechanical polishing of nickel for damascene applications | |
dc.type | Oral presentation | |
dc.contributor.imecauthor | Teugels, Lieve | |
dc.contributor.imecauthor | Van den Eynde, Matthias | |
dc.contributor.imecauthor | Delande, Tinne | |
dc.contributor.orcidimec | Teugels, Lieve::0000-0002-6613-9414 | |
dc.source.peerreview | no | |
dc.source.conference | 17th Annual International Cymposium on Chemical-Mechanical Planarization | |
dc.source.conferencedate | 12/08/2012 | |
dc.source.conferencelocation | Lake Placid, NY USA | |
dc.identifier.url | http://www.clarkson.edu/camp/cmp2012.html | |
imec.availability | Published - imec | |