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Modeling Sicl4/O2 plasmas used for depositing SiO2 coatings or mask recovery

dc.contributor.authorTinck, Stefan
dc.contributor.authorBoullart, Werner
dc.contributor.authorBogaerts, Annemie
dc.date.accessioned2021-10-20T16:56:38Z
dc.date.available2021-10-20T16:56:38Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21611
dc.sourceIIOimport
dc.titleModeling Sicl4/O2 plasmas used for depositing SiO2 coatings or mask recovery
dc.typeProceedings paper
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.beginpageP2.3.1
dc.source.conference11th Europhysics Conference on the Atomic and Molecular Physics of Ionized Gases - ESCAMPIG XXI
dc.source.conferencedate10/07/2012
dc.source.conferencelocationViana do Castelo Portugal
imec.availabilityPublished - imec


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