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dc.contributor.authorTous, Loic
dc.contributor.authorLerat, Jean-Francois
dc.contributor.authorEmeraud, Thierry
dc.contributor.authorNegru, R.
dc.contributor.authorHuet, K.
dc.contributor.authorUruena De Castro, Angel
dc.contributor.authorAleman, Monica
dc.contributor.authorRussell, Richard
dc.contributor.authorJohn, Joachim
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-10-20T17:05:24Z
dc.date.available2021-10-20T17:05:24Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21628
dc.sourceIIOimport
dc.titleNickel silicide formation using excimer laser annealing
dc.typeProceedings paper
dc.contributor.imecauthorTous, Loic
dc.contributor.imecauthorAleman, Monica
dc.contributor.imecauthorJohn, Joachim
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecTous, Loic::0000-0001-9928-7774
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage503
dc.source.endpage509
dc.source.conference2nd International Conference on Crystalline Silicon Photovoltaics - SiliconPV
dc.source.conferencedate3/05/2012
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - imec
imec.internalnotesEnergy Procedia; Vol. 27


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