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Patterning developments in spin-on hard mask systems for 30nm half pitch EUV technology

dc.contributor.authorTruffert, Vincent
dc.contributor.authorPollentier, Ivan
dc.contributor.authorFoubert, Philippe
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorWilson, Chris
dc.contributor.authorErcken, Monique
dc.contributor.authorGronheid, Roel
dc.contributor.authorDemuynck, Steven
dc.contributor.authorBuch, Xavier
dc.contributor.authorAnno, Yusuke
dc.date.accessioned2021-10-20T17:11:10Z
dc.date.available2021-10-20T17:11:10Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21639
dc.sourceIIOimport
dc.titlePatterning developments in spin-on hard mask systems for 30nm half pitch EUV technology
dc.typeProceedings paper
dc.contributor.imecauthorTruffert, Vincent
dc.contributor.imecauthorPollentier, Ivan
dc.contributor.imecauthorFoubert, Philippe
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorWilson, Chris
dc.contributor.imecauthorErcken, Monique
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorDemuynck, Steven
dc.contributor.orcidimecTruffert, Vincent::0000-0001-7851-830X
dc.contributor.orcidimecPollentier, Ivan::0000-0002-4266-6500
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage832511
dc.source.conferenceAdvances in Resist Materials and Processing Technology XXIX
dc.source.conferencedate12/02/2012
dc.source.conferencelocationSan José, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8325


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