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Modelling and experimental evaluation of (post) lithography process contributions to pattern roughness

dc.contributor.authorVaglio Pret, Alessandro
dc.date.accessioned2021-10-20T17:19:45Z
dc.date.available2021-10-20T17:19:45Z
dc.date.issued2012-07
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21656
dc.sourceIIOimport
dc.titleModelling and experimental evaluation of (post) lithography process contributions to pattern roughness
dc.typePHD thesis
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.source.peerreviewno
dc.contributor.thesisadvisorVan den hove, Luc
imec.availabilityPublished - imec


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