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Stochastic effects and resist variability in high resolution lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGaridis, K.
dc.contributor.authorGronheid, Roel
dc.contributor.authorBiafore, John
dc.date.accessioned2021-10-20T17:20:13Z
dc.date.available2021-10-20T17:20:13Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21657
dc.sourceIIOimport
dc.titleStochastic effects and resist variability in high resolution lithography
dc.typeOral presentation
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewno
dc.source.conference25th International Microprocesses and Nanotechnology Conference - MNC
dc.source.conferencedate29/10/2012
dc.source.conferencelocationKobe Japan
imec.availabilityPublished - imec


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