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Evidence of speckle in extreme-UV lithography

dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorGronheid, Roel
dc.contributor.authorEngelen, Jan
dc.contributor.authorPei-Yang, Yan
dc.contributor.authorLeeson, Michael
dc.contributor.authorYounkin, Todd
dc.date.accessioned2021-10-20T17:20:44Z
dc.date.available2021-10-20T17:20:44Z
dc.date.issued2012-10
dc.identifier.issn1094-4087
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21658
dc.sourceIIOimport
dc.titleEvidence of speckle in extreme-UV lithography
dc.typeJournal article
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorGronheid, Roel
dc.source.peerreviewyes
dc.source.beginpage25970
dc.source.endpage25978
dc.source.journalOptics Express
dc.source.issue23
dc.source.volume20
dc.identifier.urlhttp://www.opticsinfobase.org/oe/fulltext.cfm?uri=oe-20-23-25970&id=244877
imec.availabilityPublished - imec


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