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dc.contributor.authorVanbel, Maarten
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSioncke, Sonja
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorLocquet, Jean-Pierre
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCaymax, Matty
dc.contributor.authorVerbiest, Thierry
dc.date.accessioned2021-10-20T17:56:32Z
dc.date.available2021-10-20T17:56:32Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21729
dc.sourceIIOimport
dc.titleSecond-harmonic generation as characterization tool for Ge/passivation layer interfaces
dc.typeProceedings paper
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage84341F
dc.source.conferenceNonlinear Optics and Applications VI
dc.source.conferencedate16/04/2012
dc.source.conferencelocationBrussels Belgium
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8434


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