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In-line wafer-level monitoring of the strain gradient in MEMS structural layers using an optical interferometer

dc.contributor.authorVarela Pedreira, Olalla
dc.contributor.authorDe Coster, Jeroen
dc.contributor.authorSeveri, Simone
dc.contributor.authorDe Wolf, Ingrid
dc.date.accessioned2021-10-20T18:08:16Z
dc.date.available2021-10-20T18:08:16Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21754
dc.sourceIIOimport
dc.titleIn-line wafer-level monitoring of the strain gradient in MEMS structural layers using an optical interferometer
dc.typeOral presentation
dc.contributor.imecauthorVarela Pedreira, Olalla
dc.contributor.imecauthorDe Coster, Jeroen
dc.contributor.imecauthorSeveri, Simone
dc.contributor.imecauthorDe Wolf, Ingrid
dc.contributor.orcidimecDe Wolf, Ingrid::0000-0003-3822-5953
dc.source.peerreviewno
dc.source.conferenceOptical Measurement Techniques for Structures & Systems - OPTIMESS
dc.source.conferencedate4/04/2012
dc.source.conferencelocationAntwerpen Belgium
imec.availabilityPublished - imec


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