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Patterning of Hf/HfOx resistive RAM down to 20-nm CD

dc.contributor.authorVecchio, Emma
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorKar, Gouri Sankar
dc.contributor.authorBoullart, Werner
dc.contributor.authorJurczak, Gosia
dc.contributor.authorGovoreanu, Bogdan
dc.date.accessioned2021-10-20T18:10:49Z
dc.date.available2021-10-20T18:10:49Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21759
dc.sourceIIOimport
dc.titlePatterning of Hf/HfOx resistive RAM down to 20-nm CD
dc.typeMeeting abstract
dc.contributor.imecauthorVecchio, Emma
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorKar, Gouri Sankar
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGovoreanu, Bogdan
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conferencePlasma Etch and Strip in Microelectronics - PESM
dc.source.conferencedate15/03/2012
dc.source.conferencelocationGrenoble France
imec.availabilityPublished - imec


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