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Surface passivation for Si solar cells: a combination of advanced surface cleaning and thermal atomic layer deposition of Al2O3

dc.contributor.authorVermang, Bart
dc.contributor.authorRothschild, Aude
dc.contributor.authorKenis, Karine
dc.contributor.authorWostyn, Kurt
dc.contributor.authorBearda, Twan
dc.contributor.authorRacz, A.
dc.contributor.authorLoozen, Xavier
dc.contributor.authorMertens, Paul
dc.contributor.authorPoortmans, Jef
dc.contributor.authorMertens, Robert
dc.date.accessioned2021-10-20T18:28:38Z
dc.date.available2021-10-20T18:28:38Z
dc.date.issued2012
dc.identifier.issn1662-9779
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21791
dc.sourceIIOimport
dc.titleSurface passivation for Si solar cells: a combination of advanced surface cleaning and thermal atomic layer deposition of Al2O3
dc.typeJournal article
dc.contributor.imecauthorVermang, Bart
dc.contributor.imecauthorKenis, Karine
dc.contributor.imecauthorWostyn, Kurt
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorPoortmans, Jef
dc.contributor.imecauthorMertens, Robert
dc.contributor.orcidimecVermang, Bart::0000-0003-2669-2087
dc.contributor.orcidimecWostyn, Kurt::0000-0003-3995-0292
dc.contributor.orcidimecPoortmans, Jef::0000-0003-2077-2545
dc.source.peerreviewyes
dc.source.beginpage357
dc.source.endpage361
dc.source.journalSolid State Phenomena
dc.source.volume187
imec.availabilityPublished - imec
imec.internalnotesPaper from the 10th Int. Symp. on Ultra Clean Processing of Semiconductor Surfaces (UCPSS) 2010


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