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Ebeam based mask repair as door opener for defect free EUV masks

dc.contributor.authorWaiblinger, Markus
dc.contributor.authorBret, Tristan
dc.contributor.authorJonckheere, Rik
dc.contributor.authorVan Den Heuvel, Dieter
dc.date.accessioned2021-10-20T18:44:55Z
dc.date.available2021-10-20T18:44:55Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21824
dc.sourceIIOimport
dc.titleEbeam based mask repair as door opener for defect free EUV masks
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage85221M
dc.source.conferencePhotomask Technology
dc.source.conferencedate11/09/2012
dc.source.conferencelocationMonterey, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8522


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