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The door opener for EUV mask repair

dc.contributor.authorWaiblinger, Markus
dc.contributor.authorJonckheere, Rik
dc.contributor.authorBret, Tristan
dc.contributor.authorVan Den Heuvel, Dieter
dc.contributor.authorBaur, C
dc.contributor.authorBaralia, G
dc.date.accessioned2021-10-20T18:45:28Z
dc.date.available2021-10-20T18:45:28Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21825
dc.sourceIIOimport
dc.titleThe door opener for EUV mask repair
dc.typeProceedings paper
dc.contributor.imecauthorJonckheere, Rik
dc.contributor.imecauthorVan Den Heuvel, Dieter
dc.contributor.orcidimecJonckheere, Rik::0000-0003-2211-9443
dc.source.peerreviewno
dc.source.beginpage84410F
dc.source.conferencePhotomask and Next-Generation Lithography Mask Technology XIX
dc.source.conferencedate17/04/2012
dc.source.conferencelocationYokohama Japan
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8441


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