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Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorGronheid, Roel
dc.contributor.authorKim, Tae-Gon
dc.contributor.authorMertens, Paul
dc.date.accessioned2021-10-20T19:00:46Z
dc.date.available2021-10-20T19:00:46Z
dc.date.issued2012
dc.identifier.issn0167-9317
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21853
dc.sourceIIOimport
dc.titleStrength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.contributor.imecauthorMertens, Paul
dc.source.peerreviewyes
dc.source.beginpage159
dc.source.endpage162
dc.source.journalMicroelectronic Engineering
dc.source.volume98
dc.identifier.urlhttp://www.sciencedirect.com/science/article/pii/S0167931712003383
imec.availabilityPublished - imec


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