Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch

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Authors
Winroth, Gustaf; Gronheid, Roel; Kim, Tae-Gon; Mertens, Paul
ISSN
0167-9317
Journal
Microelectronic Engineering
Volume
98
Title
Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Publication type
Journal article
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