Publication:
Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Date
| dc.contributor.author | Winroth, Gustaf | |
| dc.contributor.author | Gronheid, Roel | |
| dc.contributor.author | Kim, Tae-Gon | |
| dc.contributor.author | Mertens, Paul | |
| dc.contributor.imecauthor | Gronheid, Roel | |
| dc.contributor.imecauthor | Mertens, Paul | |
| dc.date.accessioned | 2021-10-20T19:00:46Z | |
| dc.date.available | 2021-10-20T19:00:46Z | |
| dc.date.issued | 2012 | |
| dc.identifier.issn | 0167-9317 | |
| dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21853 | |
| dc.identifier.url | http://www.sciencedirect.com/science/article/pii/S0167931712003383 | |
| dc.source.beginpage | 159 | |
| dc.source.endpage | 162 | |
| dc.source.journal | Microelectronic Engineering | |
| dc.source.volume | 98 | |
| dc.title | Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch | |
| dc.type | Journal article | |
| dspace.entity.type | Publication | |
| Files | ||
| Publication available in collections: |