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Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
Publication:
Strength analysis of EUV-exposed photo resists by AFM at 40 nm half pitch
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Date
2012
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APA
Chicago
Harvard
IEEE
Basic data
APA
Chicago
Harvard
IEEE
Author(s)
Winroth, Gustaf
;
Gronheid, Roel
;
Kim, Tae-Gon
;
Mertens, Paul
Journal
Microelectronic Engineering
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1887
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Acq. date: 2025-12-10
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Metrics
Views
1887
since deposited on 2021-10-20
1
last month
Acq. date: 2025-12-10
Citations