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Relationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists

dc.contributor.authorWinroth, Gustaf
dc.contributor.authorYounkin, Todd
dc.contributor.authorBlackwell, James M.
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-20T19:02:16Z
dc.date.available2021-10-20T19:02:16Z
dc.date.issued2012
dc.identifier.issn1071-1023
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21856
dc.sourceIIOimport
dc.titleRelationship between film thickness loss and polymer deprotection for extreme ultraviolet and ArF photoresists
dc.typeJournal article
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage06FG01
dc.source.journalJournal of Vacuum Science and Technology B
dc.source.issue6
dc.source.volume30
imec.availabilityPublished - open access
imec.internalnotesPaper from the 56th International Conference on Electron, Ion, and Photon Beam Technology and Nanofabrication - EIPBN 2012


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