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Process and stack optimization for low-power scaled HfO2-based RRAM

dc.contributor.authorWouters, Dirk
dc.date.accessioned2021-10-20T19:04:41Z
dc.date.available2021-10-20T19:04:41Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21861
dc.sourceIIOimport
dc.titleProcess and stack optimization for low-power scaled HfO2-based RRAM
dc.typeOral presentation
dc.source.peerreviewno
dc.source.conference2nd International Workshop on Resistive RAM
dc.source.conferencedate8/10/2012
dc.source.conferencelocationStanford, CA USA
imec.availabilityPublished - imec


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