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Advances and challenges in ultra low-k patterning

dc.contributor.authorXu, Kaidong
dc.contributor.authorSouriau, Laurent
dc.contributor.authorLazzarino, Frederic
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorBoullart, Werner
dc.date.accessioned2021-10-20T19:08:56Z
dc.date.available2021-10-20T19:08:56Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21869
dc.sourceIIOimport
dc.titleAdvances and challenges in ultra low-k patterning
dc.typeMeeting abstract
dc.contributor.imecauthorSouriau, Laurent
dc.contributor.imecauthorLazzarino, Frederic
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorBoullart, Werner
dc.contributor.orcidimecSouriau, Laurent::0000-0002-5138-5938
dc.contributor.orcidimecLazzarino, Frederic::0000-0001-7961-9727
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.source.peerreviewyes
dc.source.conferenceChina Semiconductor Technology International Conference - CSTIC
dc.source.conferencedate18/03/2012
dc.source.conferencelocationShanghai China
imec.availabilityPublished - imec


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