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Wetting challenges in cleaning of high aspect ratio nano-structures

dc.contributor.authorXu, XiuMei
dc.contributor.authorVereecke, Guy
dc.contributor.authorVan den Hoogen, Erik
dc.contributor.authorSmeers, Jens
dc.contributor.authorArmini, Silvia
dc.contributor.authorDelande, Tinne
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-20T19:09:58Z
dc.date.available2021-10-20T19:09:58Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21871
dc.sourceIIOimport
dc.titleWetting challenges in cleaning of high aspect ratio nano-structures
dc.typeMeeting abstract
dc.contributor.imecauthorXu, XiuMei
dc.contributor.imecauthorVereecke, Guy
dc.contributor.imecauthorArmini, Silvia
dc.contributor.imecauthorDelande, Tinne
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecXu, XiuMei::0000-0002-3356-8693
dc.contributor.orcidimecVereecke, Guy::0000-0001-9058-9338
dc.contributor.orcidimecArmini, Silvia::0000-0003-0578-3422
dc.source.peerreviewyes
dc.source.beginpage6.4
dc.source.conference11th International Symposium on Ultra Clean Processing of Semiconductor Surfaces - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - imec


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