Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching
dc.contributor.author | Yanovich, S. | |
dc.contributor.author | Baklanov, Mikhaïl | |
dc.contributor.author | Gushchin, O. | |
dc.contributor.author | Gornev, E. | |
dc.contributor.author | Danila, A. | |
dc.date.accessioned | 2021-10-20T19:12:38Z | |
dc.date.available | 2021-10-20T19:12:38Z | |
dc.date.issued | 2012 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/21876 | |
dc.source | IIOimport | |
dc.title | Maskless fabrication of high density silicon nan-pin structures with carbon nano clusters acting as mask for subsequent microwave silicon etching | |
dc.type | Meeting abstract | |
dc.source.peerreview | no | |
dc.source.conference | Plasma Etch and Strip in Microelectronics - PESM | |
dc.source.conferencedate | 15/03/2012 | |
dc.source.conferencelocation | Grenoble France | |
imec.availability | Published - imec |
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