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Optical proximity effects correction at 0.25 mm incorporating process variations in lithography

dc.contributor.authorTritchkov, Alexander
dc.contributor.authorRieger, M.
dc.contributor.authorStirniman, J.
dc.contributor.authorYen, Anthony
dc.contributor.authorRonse, Kurt
dc.contributor.authorVandenberghe, Geert
dc.contributor.authorVan den hove, Luc
dc.date.accessioned2021-09-30T09:40:58Z
dc.date.available2021-09-30T09:40:58Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2187
dc.sourceIIOimport
dc.titleOptical proximity effects correction at 0.25 mm incorporating process variations in lithography
dc.typeProceedings paper
dc.contributor.imecauthorRonse, Kurt
dc.contributor.imecauthorVandenberghe, Geert
dc.contributor.imecauthorVan den hove, Luc
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage726
dc.source.endpage738
dc.source.conferenceOptical Microlithography X
dc.source.conferencedate12/03/1997
dc.source.conferencelocationSanta Clara, CA USA
imec.availabilityPublished - open access
imec.internalnotesProceedings of SPIE; Vol. 3051


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