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A comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100

dc.contributor.authorYounkin, Todd
dc.contributor.authorWinroth, Gustaf
dc.contributor.authorGronheid, Roel
dc.date.accessioned2021-10-20T19:24:08Z
dc.date.available2021-10-20T19:24:08Z
dc.date.issued2012
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21898
dc.sourceIIOimport
dc.titleA comparison of positive- and negative tone contact hole process flows using the IMEC NXE 3100
dc.typeProceedings paper
dc.contributor.imecauthorGronheid, Roel
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.conferenceInternational Symposium on Extreme Ultraviolet Lithography - EUVL
dc.source.conferencedate30/09/2012
dc.source.conferencelocationBrussel Belgium
imec.availabilityPublished - open access


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