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Surface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide

dc.contributor.authorAdelmann, Christoph
dc.contributor.authorCuypers, Daniel
dc.contributor.authorTallarida, Massimo
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorDe Clercq, Astrid
dc.contributor.authorFriedrich, Daniel
dc.contributor.authorConard, Thierry
dc.contributor.authorDelabie, Annelies
dc.contributor.authorSeo, Jin Won
dc.contributor.authorLocquet, Jean-Pierre
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorSchmeisser, Dieter
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorCaymax, Matty
dc.date.accessioned2021-10-21T06:42:02Z
dc.date.available2021-10-21T06:42:02Z
dc.date.issued2013
dc.identifier.issn0897-4756
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21950
dc.sourceIIOimport
dc.titleSurface chemistry and interface formation during the atomic layer deposition of alumina from trimethyl aluminum and water on indium phosphide
dc.typeJournal article
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorDelabie, Annelies
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorCaymax, Matty
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.identifier.doi10.1021/cm304070h
dc.source.peerreviewyes
dc.source.beginpage1078
dc.source.endpage1091
dc.source.journalChemistry of Materials
dc.source.issue7
dc.source.volume25
imec.availabilityPublished - imec


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