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Lithography imaging control by enhanced monitoring of light source performance

dc.contributor.authorAlagna, Paolo
dc.contributor.authorZurita, Omar
dc.contributor.authorLalovic, Ivan
dc.contributor.authorSeong, Nakgeuon
dc.contributor.authorRechsteiner, Gregory
dc.contributor.authorThornes, Joshua
dc.contributor.authorD'have, Koen
dc.contributor.authorVan Look, Lieve
dc.contributor.authorBekaert, Joost
dc.date.accessioned2021-10-21T06:42:12Z
dc.date.available2021-10-21T06:42:12Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21960
dc.sourceIIOimport
dc.titleLithography imaging control by enhanced monitoring of light source performance
dc.typeProceedings paper
dc.contributor.imecauthorAlagna, Paolo
dc.contributor.imecauthorD'have, Koen
dc.contributor.imecauthorVan Look, Lieve
dc.contributor.imecauthorBekaert, Joost
dc.contributor.orcidimecD'have, Koen::0000-0002-5195-9241
dc.contributor.orcidimecBekaert, Joost::0000-0003-3075-3479
dc.source.peerreviewyes
dc.source.beginpage86830S
dc.source.conferenceOptical Microlithography XXVI
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8683


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