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FinFET patterning process challenges

dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorCollaert, Nadine
dc.date.accessioned2021-10-21T06:42:19Z
dc.date.available2021-10-21T06:42:19Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/21965
dc.sourceIIOimport
dc.titleFinFET patterning process challenges
dc.typeMeeting abstract
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorCollaert, Nadine
dc.contributor.orcidimecCollaert, Nadine::0000-0002-8062-3165
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage863
dc.source.conference223rd ECS Meeting Symposium: Patterning and Lithography Challenges
dc.source.conferencedate12/05/2013
dc.source.conferencelocationToronto Canada
dc.identifier.urlhttp://ma.ecsdl.org/content/MA2013-01/20/863.abstract
imec.availabilityPublished - open access
imec.internalnotesECS Meeting Abstracts; Vol. MA2013-01


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