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Plasma processing of low-k dielectrics

dc.contributor.authorBaklanov, Mikhaïl
dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorShamiryan, D.
dc.contributor.authorUrbanowicz, A.
dc.contributor.authorShi, H.
dc.contributor.authorRakhimova, T.V.
dc.contributor.authorHuang, H.
dc.contributor.authorHo, P.S.
dc.date.accessioned2021-10-21T06:44:18Z
dc.date.available2021-10-21T06:44:18Z
dc.date.issued2013
dc.identifier.issn0021-8979
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22014
dc.sourceIIOimport
dc.titlePlasma processing of low-k dielectrics
dc.typeJournal article
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage41101
dc.source.journalJournal of Applied Physics
dc.source.issue4
dc.source.volume113
imec.availabilityPublished - open access


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