Plasma processing of low-k dielectrics

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Authors

Baklanov, Mikhaïl; de Marneffe, Jean-Francois; Shamiryan, D.; Urbanowicz, A.; Shi, H.; Rakhimova, T.V.; Huang, H.; Ho, P.S.

ISSN

0021-8979

Issue

4

Journal

Journal of Applied Physics

Volume

113

Title

Plasma processing of low-k dielectrics

Publication type

Journal article

Embargo date

9999-12-31

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