Plasma processing of low-k dielectrics

dc.contributor.author	Baklanov, Mikhaïl
dc.contributor.author	de Marneffe, Jean-Francois
dc.contributor.author	Shamiryan, D.
dc.contributor.author	Urbanowicz, A.
dc.contributor.author	Shi, H.
dc.contributor.author	Rakhimova, T.V.
dc.contributor.author	Huang, H.
dc.contributor.author	Ho, P.S.
dc.contributor.imecauthor	de Marneffe, Jean-Francois
dc.date.accessioned	2021-10-21T06:44:18Z
dc.date.available	2021-10-21T06:44:18Z
dc.date.embargo	9999-12-31
dc.date.issued	2013
dc.identifier.issn	0021-8979
dc.identifier.uri	https://imec-publications.be/handle/20.500.12860/22014
dc.source.beginpage	41101
dc.source.issue	4
dc.source.journal	Journal of Applied Physics
dc.source.volume	113
dc.title	Plasma processing of low-k dielectrics
dc.type	Journal article
dspace.entity.type	Publication
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