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Effect of the surface/water chemistry on the creation of watermarks

dc.contributor.authorBelmiloud, Naser
dc.contributor.authorTamaddon, Amir-Hossein
dc.contributor.authorMertens, Paul
dc.contributor.authorStruyf, Herbert
dc.date.accessioned2021-10-21T06:45:31Z
dc.date.available2021-10-21T06:45:31Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22031
dc.sourceIIOimport
dc.titleEffect of the surface/water chemistry on the creation of watermarks
dc.typeProceedings paper
dc.contributor.imecauthorTamaddon, Amir-Hossein
dc.contributor.imecauthorMertens, Paul
dc.contributor.imecauthorStruyf, Herbert
dc.contributor.orcidimecTamaddon, Amir-Hossein::0000-0003-4566-0697
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage227
dc.source.endpage230
dc.source.conferenceUltra Clean Processing of Semiconductor Surfaces XI - UCPSS
dc.source.conferencedate17/09/2012
dc.source.conferencelocationGent Belgium
imec.availabilityPublished - open access
imec.internalnotesSolid State Phenomena; Vol. 195


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