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STT MRAM patterning challenges

dc.contributor.authorBoullart, Werner
dc.contributor.authorRadisic, Dunja
dc.contributor.authorParaschiv, Vasile
dc.contributor.authorCornelissen, Sven
dc.contributor.authorManfrini, Mauricio
dc.contributor.authoryatsuda, koichi
dc.contributor.authorNishimura, Eiichi
dc.contributor.authorOhishi, Tetsuya
dc.contributor.authorTahara, Shigeru
dc.date.accessioned2021-10-21T06:48:55Z
dc.date.available2021-10-21T06:48:55Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22069
dc.sourceIIOimport
dc.titleSTT MRAM patterning challenges
dc.typeProceedings paper
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorRadisic, Dunja
dc.contributor.imecauthorParaschiv, Vasile
dc.contributor.imecauthorManfrini, Mauricio
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecManfrini, Mauricio::0000-0003-3609-2042
dc.source.peerreviewyes
dc.source.beginpage86850F
dc.source.conferenceAdvanced Etch Technology for Nanopatterning II
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674534
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 86850F


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