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Sub-0.25 μm lithography using deep-UV and optical enhancement techniques

dc.contributor.authorVan den hove, Luc
dc.contributor.authorRonse, Kurt
dc.date.accessioned2021-09-30T09:46:12Z
dc.date.available2021-09-30T09:46:12Z
dc.date.issued1997
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/2214
dc.sourceIIOimport
dc.titleSub-0.25 μm lithography using deep-UV and optical enhancement techniques
dc.typeProceedings paper
dc.contributor.imecauthorVan den hove, Luc
dc.contributor.imecauthorRonse, Kurt
dc.contributor.orcidimecRonse, Kurt::0000-0003-0803-4267
dc.date.embargo9999-12-31
dc.source.peerreviewno
dc.source.beginpage503
dc.source.endpage515
dc.source.conferenceULSI Science and Technology 1997
dc.source.conferencedate5/05/1997
dc.source.conferencelocationMontréal Canada
imec.availabilityPublished - open access
imec.internalnotesECS Proceedings; Vol.97-3


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