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Degradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profiling

dc.contributor.authorConard, Thierry
dc.contributor.authorFranquet, Alexis
dc.contributor.authorTsvetanova, Diana
dc.contributor.authorMouhib, Tariq
dc.contributor.authorVandervorst, Wilfried
dc.date.accessioned2021-10-21T07:01:54Z
dc.date.available2021-10-21T07:01:54Z
dc.date.issued2013
dc.identifier.issn0142-2421
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22166
dc.sourceIIOimport
dc.titleDegradation of deep ultraviolet photoresist by As-implantation studied by Ar-cluster beam profiling
dc.typeJournal article
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorFranquet, Alexis
dc.contributor.imecauthorTsvetanova, Diana
dc.contributor.imecauthorVandervorst, Wilfried
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecFranquet, Alexis::0000-0002-7371-8852
dc.source.peerreviewyes
dc.source.beginpage406
dc.source.endpage408
dc.source.journalSurface and Interface Analysis
dc.source.issue1
dc.source.volume45
dc.identifier.urlhttp://onlinelibrary.wiley.com/doi/10.1002/sia.5126/abstract
imec.availabilityPublished - imec


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