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Wet chemical etching of InP for cleaning applications: I. An oxide formation/oxide dissolution model

dc.contributor.authorCuypers, Daniel
dc.contributor.authorDe Gendt, Stefan
dc.contributor.authorArnauts, Sophia
dc.contributor.authorPaulussen, Kris
dc.contributor.authorvan Dorp, Dennis
dc.date.accessioned2021-10-21T07:06:30Z
dc.date.available2021-10-21T07:06:30Z
dc.date.issued2013
dc.identifier.issn2162-8769
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22194
dc.sourceIIOimport
dc.titleWet chemical etching of InP for cleaning applications: I. An oxide formation/oxide dissolution model
dc.typeJournal article
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorPaulussen, Kris
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.contributor.orcidimecPaulussen, Kris::0000-0002-8945-2438
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.source.peerreviewyes
dc.source.beginpageP185
dc.source.endpageP189
dc.source.journalECS Journal of Solid State Science and Technology
dc.source.issue4
dc.source.volume2
imec.availabilityPublished - imec


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