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Study of InP surfaces after wet chemical treatments

dc.contributor.authorCuypers, Daniel
dc.contributor.authorvan Dorp, Dennis
dc.contributor.authorTallarida, Massimo
dc.contributor.authorBrizzi, Simone
dc.contributor.authorRodriguez, Leonard
dc.contributor.authorConard, Thierry
dc.contributor.authorArnauts, Sophia
dc.contributor.authorSchmeisser, Dieter
dc.contributor.authorAdelmann, Christoph
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T07:06:53Z
dc.date.available2021-10-21T07:06:53Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22196
dc.sourceIIOimport
dc.titleStudy of InP surfaces after wet chemical treatments
dc.typeProceedings paper
dc.contributor.imecauthorvan Dorp, Dennis
dc.contributor.imecauthorConard, Thierry
dc.contributor.imecauthorArnauts, Sophia
dc.contributor.imecauthorAdelmann, Christoph
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecvan Dorp, Dennis::0000-0002-1085-4232
dc.contributor.orcidimecConard, Thierry::0000-0002-4298-5851
dc.contributor.orcidimecAdelmann, Christoph::0000-0002-4831-3159
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage297
dc.source.endpage303
dc.source.conferenceSemiconductor Cleaning Science and Technology 13
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco USA
dc.identifier.urlhttp://ecst.ecsdl.org/content/58/6/297.abstract
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 58, Issue 6


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