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From precursor towards incorported Al in ZnO TCO films

dc.contributor.authorDamm, Hanne
dc.contributor.authorElen, Ken
dc.contributor.authorDe Dobbelaere, Christopher
dc.contributor.authorVan den broeck, F.
dc.contributor.authorMartins, J.
dc.contributor.authorD'Haen, Jan
dc.contributor.authorAdriaenssens, Peter
dc.contributor.authorHardy, An
dc.contributor.authorVan Bael, Marlies
dc.date.accessioned2021-10-21T07:07:31Z
dc.date.available2021-10-21T07:07:31Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22200
dc.sourceIIOimport
dc.titleFrom precursor towards incorported Al in ZnO TCO films
dc.typeOral presentation
dc.contributor.imecauthorElen, Ken
dc.contributor.imecauthorD'Haen, Jan
dc.contributor.imecauthorHardy, An
dc.contributor.imecauthorVan Bael, Marlies
dc.contributor.orcidimecElen, Ken::0000-0001-6907-0355
dc.contributor.orcidimecVan Bael, Marlies::0000-0002-5516-7962
dc.source.peerreviewno
dc.source.conferenceYoung Belgian Magnetic Resonance Scientist
dc.source.conferencedate2/12/2013
dc.source.conferencelocationBkankenberge Belgium
imec.availabilityPublished - imec


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