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Effect of 147 nm radiation on a 2.0 porous organo-Silicon glass

dc.contributor.authorde Marneffe, Jean-Francois
dc.contributor.authorLukaszewicz, Mikolaj
dc.contributor.authorPorter, Stephen
dc.contributor.authorZhang, Liping
dc.contributor.authorHeyne, Markus
dc.contributor.authorBaklanov, Mikhaïl
dc.date.accessioned2021-10-21T07:09:28Z
dc.date.available2021-10-21T07:09:28Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22211
dc.sourceIIOimport
dc.titleEffect of 147 nm radiation on a 2.0 porous organo-Silicon glass
dc.typeMeeting abstract
dc.contributor.imecauthorde Marneffe, Jean-Francois
dc.contributor.imecauthorZhang, Liping
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage119
dc.source.endpage120
dc.source.conferenceMaterials for Advanced Metallization - MAM
dc.source.conferencedate11/03/2013
dc.source.conferencelocationLeuven Belgium
imec.availabilityPublished - open access
imec.internalnotesP4-11


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