Show simple item record

dc.contributor.authorDe Schepper, Peter
dc.contributor.authorHansen, Terje
dc.contributor.authorAltamirano Sanchez, Efrain
dc.contributor.authorVaglio Pret, Alessandro
dc.contributor.authorBoullart, Werner
dc.contributor.authorDe Gendt, Stefan
dc.date.accessioned2021-10-21T07:10:27Z
dc.date.available2021-10-21T07:10:27Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22217
dc.sourceIIOimport
dc.titleLine edge and width roughness smoothing by plasma treatment
dc.typeProceedings paper
dc.contributor.imecauthorDe Schepper, Peter
dc.contributor.imecauthorAltamirano Sanchez, Efrain
dc.contributor.imecauthorVaglio Pret, Alessandro
dc.contributor.imecauthorBoullart, Werner
dc.contributor.imecauthorDe Gendt, Stefan
dc.contributor.orcidimecBoullart, Werner::0000-0001-7614-2097
dc.contributor.orcidimecDe Gendt, Stefan::0000-0003-3775-3578
dc.source.peerreviewyes
dc.source.beginpage868505
dc.source.conferenceAdvanced Etch Technology for Nanopatterning II
dc.source.conferencedate24/02/2013
dc.source.conferencelocationSan Jose, CA USA
dc.identifier.urlhttp://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674528
imec.availabilityPublished - imec
imec.internalnotesProceedings of SPIE; Vol. 8685


Files in this item

FilesSizeFormatView

There are no files associated with this item.

This item appears in the following collection(s)

Show simple item record