dc.contributor.author | De Schepper, Peter | |
dc.contributor.author | Hansen, Terje | |
dc.contributor.author | Altamirano Sanchez, Efrain | |
dc.contributor.author | Vaglio Pret, Alessandro | |
dc.contributor.author | Boullart, Werner | |
dc.contributor.author | De Gendt, Stefan | |
dc.date.accessioned | 2021-10-21T07:10:27Z | |
dc.date.available | 2021-10-21T07:10:27Z | |
dc.date.issued | 2013 | |
dc.identifier.uri | https://imec-publications.be/handle/20.500.12860/22217 | |
dc.source | IIOimport | |
dc.title | Line edge and width roughness smoothing by plasma treatment | |
dc.type | Proceedings paper | |
dc.contributor.imecauthor | De Schepper, Peter | |
dc.contributor.imecauthor | Altamirano Sanchez, Efrain | |
dc.contributor.imecauthor | Vaglio Pret, Alessandro | |
dc.contributor.imecauthor | Boullart, Werner | |
dc.contributor.imecauthor | De Gendt, Stefan | |
dc.contributor.orcidimec | Boullart, Werner::0000-0001-7614-2097 | |
dc.contributor.orcidimec | De Gendt, Stefan::0000-0003-3775-3578 | |
dc.source.peerreview | yes | |
dc.source.beginpage | 868505 | |
dc.source.conference | Advanced Etch Technology for Nanopatterning II | |
dc.source.conferencedate | 24/02/2013 | |
dc.source.conferencelocation | San Jose, CA USA | |
dc.identifier.url | http://proceedings.spiedigitallibrary.org/proceeding.aspx?articleid=1674528 | |
imec.availability | Published - imec | |
imec.internalnotes | Proceedings of SPIE; Vol. 8685 | |