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Control of metal/oxide electron barriers in CB-RAM cells by low work-function liners

dc.contributor.authorDe Stefano, Francesca
dc.contributor.authorAfanasiev, Valeri
dc.contributor.authorHoussa, Michel
dc.contributor.authorStesmans, Andre
dc.contributor.authorOpsomer, Karl
dc.contributor.authorJurczak, Gosia
dc.contributor.authorGoux, Ludovic
dc.date.accessioned2021-10-21T07:11:41Z
dc.date.available2021-10-21T07:11:41Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22224
dc.sourceIIOimport
dc.titleControl of metal/oxide electron barriers in CB-RAM cells by low work-function liners
dc.typeMeeting abstract
dc.contributor.imecauthorDe Stefano, Francesca
dc.contributor.imecauthorAfanasiev, Valeri
dc.contributor.imecauthorHoussa, Michel
dc.contributor.imecauthorStesmans, Andre
dc.contributor.imecauthorOpsomer, Karl
dc.contributor.imecauthorJurczak, Gosia
dc.contributor.imecauthorGoux, Ludovic
dc.contributor.orcidimecHoussa, Michel::0000-0003-1844-3515
dc.contributor.orcidimecGoux, Ludovic::0000-0002-1276-2278
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage108
dc.source.endpage109
dc.source.conference18th Conference of Insulting Films on Semiconductors - INFOS: Book of Abstracts
dc.source.conferencedate25/06/2013
dc.source.conferencelocationCracow Poland
imec.availabilityPublished - open access


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