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Conductivity improvements of atomic layer deposited Ta3N5

dc.contributor.authorDekkers, Harold
dc.contributor.authorLima, Lucas Petersen Barbose
dc.contributor.authorVan Elshocht, Sven
dc.date.accessioned2021-10-21T07:15:38Z
dc.date.available2021-10-21T07:15:38Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22245
dc.sourceIIOimport
dc.titleConductivity improvements of atomic layer deposited Ta3N5
dc.typeProceedings paper
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.source.peerreviewyes
dc.source.beginpage195
dc.source.endpage202
dc.source.conferenceAtomic Layer Deposition Applications 9
dc.source.conferencedate28/10/2013
dc.source.conferencelocationSan Francisco, CA USA
dc.identifier.urlcontent/58/10/195.full.pdf+html?sid=9d938819-9116-4bea-a5c6-18731b030d8e
imec.availabilityPublished - imec
imec.internalnotesECS Transactions; Vol. 58, Issue 10


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