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Atomic layer deposition of Ta3N5

dc.contributor.authorDekkers, Harold
dc.contributor.authorVan Elshocht, Sven
dc.contributor.authorPetersen Barbosa Lima, Lucas
dc.date.accessioned2021-10-21T07:15:48Z
dc.date.available2021-10-21T07:15:48Z
dc.date.issued2013
dc.identifier.urihttps://imec-publications.be/handle/20.500.12860/22246
dc.sourceIIOimport
dc.titleAtomic layer deposition of Ta3N5
dc.typeMeeting abstract
dc.contributor.imecauthorDekkers, Harold
dc.contributor.imecauthorVan Elshocht, Sven
dc.contributor.imecauthorPetersen Barbosa Lima, Lucas
dc.contributor.orcidimecDekkers, Harold::0000-0003-4778-5709
dc.contributor.orcidimecVan Elshocht, Sven::0000-0002-6512-1909
dc.date.embargo9999-12-31
dc.source.peerreviewyes
dc.source.beginpage1881
dc.source.conference224th Electrochemical Society Fall Meeting
dc.source.conferencedate27/10/2013
dc.source.conferencelocationSan Francisco, CA USA
imec.availabilityPublished - open access


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